Substrate Thermal Heating Rates as a Function of Magnetically Controlled Plasma Impedance on Rotary Cathodes

Presented by Patrick Morse, Sputtering Components Inc.

The thermal budget for web based polymer substrates is a critical parameter to consider whenever depositing sputtered thin films. Electron heating and bombardment of high energy particles are commonly thought to be the primary source of substrate heating in a rotary magnetron sputtering process. The rate of energy transfer between the target and substrate as a function of plasma impedance is explored using a remotely adjustable magnet bar to control the positions of the magnets relative to the target surface.