Multiphysics Simulation Strategies for Optimizing Magnetron Sputtering Uniformity in High-Speed Roll-to-Roll Systems

Presented by Patrick L Morse, Arizona Thin Film

As roll-to-roll (R2R) processing scales to wider webs and faster line speeds, maintaining cross-web deposition uniformity becomes increasingly complex. Traditional empirical "trial-and-error" optimization is costly and time-consuming in vacuum environments. This paper presents a computational approach using COMSOL Multiphysics to optimize sputter zone configurations. By employing Charged Particle Tracing simulations, we evaluate the synergistic effects of cathode placement, anode configurations, and power supply characteristics (DC vs. Bi-Polar pulsed DC) on plasma uniformity and thin-film distribution. The study specifically examines how the physical geometry of the deposition zone can provide a framework for predicting deposition profiles, allowing for virtual prototyping of cathode arrays before physical implementation, ultimately reducing material waste and improving film quality.