Presented by Dr. Charles Bishop | C.A. Bishop Consulting Ltd.
Dr. Charles Bishop, C.a. Bishop Consulting Ltd. In this talk I will explain how magnetron sputtering was such a large step forward over simple DC sputtering. I will describe how the magnets confine the electrons and result in the plasma density being increased resulting a higher sputtering rate. I will then discuss how the magnets positioning can change the erosion profile of the target. This will include the difference between balanced and unbalanced magnetrons as well as using multiple magnetrons that may be coupled as in the closed field sputtering systems or decoupled. Finally the coating uniformity will be discussed particularly with respect to the magnetron width compared to the film width and transverse coating uniformity.
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