Development of Roll-to-Roll (R2R) Continuous Manufacturing System for Digital Patterning Lithography Process

Presented by Jaeyoung Kim, Korea Institute of Machinery and Materials (KIMM)

This paper introduces the development of a maskless roll-to-roll (R2R) digital exposure process for continuous manufacturing systems. Applying digital exposure technology to the R2R system facilitates high-quality and large-scale production and proposes solutions to various emerging challenges. Notably, a patterning roller based on air bearings, capable of six-degree freedom control, has been designed to minimize runout effects during rotation. This feature facilitates precise positioning and speed control, essential for high-precision patterning and exposure processes. The system incorporates four tension zones to maintain consistent web tension, utilizing advanced controllers to enhance system response rates. A cascade control strategy has been developed for the tension control to achieve high-precision web transportation. Furthermore, air-floating rollers reduce static friction between rollers and film, enhancing web transport precision. A strobe-based vision camera system has been established to examine film deformation and slippage, assessing resolution, repeatability, and clamping stability. These advancements increase the practical applicability of the R2R continuous manufacturing system, demonstrating the potential of continuous manufacturing technology based on digital exposure across various industrial applications.